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Applied Seals North America Champions Industry Effort to Establish Global Standards for Semiconductor-Grade O-Rings

NEWARK, Calif. Jan. 25, 2011 Applied Seals North America, Inc. SEMI Standards

$400 million Dalia Vernikovsky

January 21 Parker Hannifin

"Our charter is to educate the industry and eliminate the misapplication of o-rings, which results in significant costs and downtime," Vernikovsky said. "Defining sealing standards can save the industry a huge amount of time and money because seals are so pervasive in everything from ultrapure water systems and chemical handling to virtually all deposition, etching and cleaning steps."

In its first meeting, task force members agreed to focus the group’s early efforts on developing standards for:

  • Specifying the important parameters to consider for these standards and how to measure them, which is quite challenging due to the wide variety of chemical and physical properties for both seals and semiconductor-manufacturing processes
  • Rating the applicability of seals to create a standard way of measuring successful sealing performance

Up-to-date standards are needed to define semiconductor-grade sealing characteristics required for manufacturing ICs today. Most sealing technology used in wafer fabs was originally developed for unrelated applications in heavy industry, not sensitive IC production. As the semiconductor industry advances, factors ranging from the design of slit valves and gates to seals’ compatibility with next-generation processing materials must be examined to assess their ability to accommodate smaller device geometries and larger wafer diameters.

Currently, the only industry standard for semiconductor-grade seals is a general guideline for using elastomeric sealing technology. Vernikovsky spearheaded its development in 1999, leading to SEMI’s publication of the guideline in 2000.

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About Applied Seals North America

SOURCE Applied Seals North America, Inc.

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