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Cymer Announces Focus Drilling Technology for Immersion Light Sources

SAN DIEGO March 1, 2011 SPIE Advanced Lithography 2011 Cymer, Inc. XLR 600ix XLR500i XLA 400 XLA 300

Laser focus drilling technology was developed to aid chipmakers in patterning deep contact and via structures with thick resists where high depth of focus is required. Cymer’s focus drilling solution is supported by a technique involving operation of the light source at multiple bandwidths utilizing metrology that was designed to measure high-bandwidth spectra. Additionally, the unique spectral shape of Cymer’s light sources can improve depth of focus with minimal impact on other key process parameters.

Ed Brown

Light sources equipped with focus drilling are being qualified, and are currently under chipmaker evaluation.

Erin Coller [email protected]

About Cymer

San Diego, Calif. www.cymer.com

Cymer and all other Cymer product or service names used herein are either registered trademarks or trademarks of Cymer, Inc. Any other marks mentioned herein are the property of their respective holders.

Forward Looking Statements

the United States

SOURCE Cymer, Inc.

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